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1.
Nanomaterials (Basel) ; 14(8)2024 Apr 10.
Artigo em Inglês | MEDLINE | ID: mdl-38668153

RESUMO

In recent years, advances in materials engineering based on adaptive electronics have found a new paradigm to optimize drawbacks in signal processing. A two-layer MnO/ZnO:Zn heterostructure envisioned for frequency adaptive electronic signal processing is synthesized by sputtering, where the use of internal states allows reconfigurability to obtain new operating modes at different frequency input signals. X-ray diffraction (XRD) analysis is performed on each layer, revealing a cubic structure for MnO and a hexagonal structure for ZnO:Zn with preferential growth in [111] and [002] directions, respectively. Scanning electron microscope (SEM) micrographs show that the surface of both materials is homogeneous and smooth. The thickness for each layer is determined to be approximately 106.3 nm for MnO, 119.3 nm for ZnO:Zn and 224.1 nm for the MnO/ZnO:Zn structure. An electrical characterisation with an oscilloscope and signal generator was carried out to obtain the time-response signals and current-voltage (I-V) curves, where no degradation is detected when changing frequencies within the range of 100 Hz to 1 MHz. An equivalent circuit is proposed to explain the effects in the interface. Measurements of switching speeds from high resistance state (HRS) to low resistance state (LRS) at approximately 17 ns, highlight the device's rapid adaptability, and an estimated switching ratio of approximately 2 × 104 indicates its efficiency as a memristive component. Finally, the MnO/ZnO:Zn heterojunction delivers states that are stable, repeatable, and reproducible, demonstrating how the interaction of the materials can be utilised in adaptive device applications by applying frequencies and internal states to create new and innovative design schematics, thus reducing the number of components/connections in a system for future sustainable electronics.

2.
Materials (Basel) ; 11(10)2018 Sep 20.
Artigo em Inglês | MEDLINE | ID: mdl-30241293

RESUMO

The preparation of ultra-thin semi-transparent solar cells with potential applications in windows or transparent roofs entails several challenges due to the very small thickness of the layers involved. In particular, problems related to undesired inter-diffusion or inhomogeneities originated by incomplete coverage of the growing surfaces must be prevented. In this paper, undoped SnO2, CdS, and CdTe thin films with thickness suitable for use in ultra-thin solar cells were deposited with a radiofrequency (RF) magnetron sputtering technique onto conductive glass. Preparation conditions were found for depositing the individual layers with good surface coverage, absence of pin holes and with a relatively small growth rate adapted for the control of very small thickness. After a careful growth calibration procedure, heterostructured solar cells devices were fabricated. The influence of an additional undoped SnO2 buffer layer deposited between the conductive glass and the CdS window was studied. The incorporation of this layer led to an enhancement of both short circuit current and open circuit voltage (by 19 and 32%, respectively) without appreciable changes of other parameters. After the analysis of the cell parameters extracted from the current-voltage (I-V) curves, possible origins of these effects were found to be: Passivation effects of the SnO2/CdS interface, blocking of impurities diffusion or improvement of the band alignment.

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